PHOTOPHYSICAL AND MORPHOLOGICAL PROPERTIES OF SYMMETRICAL SCHIFF BASES ASSEMBLED IN SPIN-COATED FILMS

Authors

  • Caldera-Villalobos M., Herrera-González A.M., Coreño-Alonso O.

DOI:

https://doi.org/10.52783/rlq.5

Abstract

The aim of this work was to study the photophysical and morphological properties of two Schiff bases 3a and 3b synthesized by the condensation of terephthaldehyde with two alkoxyanilines. Both compounds exhibit fluorescence quenching in solution when the concentration increases from 1x10-5 to 6x10-5 M. Both Schiff bases are semiconductor materials with an optical band gap of 2.2 eV. 3a and 3b were deposited on quartz substrates by spin coating, and the films were characterized optically and morphologically. The photoluminescence maps of films revealed a continuous emission in the blue region when 3a and 3b are excited between 290 and 320 nm. SEM images revealed the crystallization of both compounds in the films and AFM images showed the irregular topography of films with high values of height and rugosity. XRD patterns of 3a and 3b deposited in films showed the semicrystalline nature of these Schiff bases showing that self-assembly affects the morphological characteristics of both compounds. Due to their properties, these materials could be suitable as thermo-mechanical sensors in polymer matrixes and for developing optoelectronic devices. © 2023 Laboratorios Mixim S.A. de C.V.. All rights reserved.

Published

2025-02-15

Issue

Section

Articles